A Research Center on Nanomaterials and Energy
 
High Temperature Tube Furnace (HTF)
Site : Nanomaterials component (Room CB-3485)
Contact : Gwenaël Chamoulaud or Galyna Shul.

Instrument description :


The OTF-1200X-III high temperature tube furnace uses SiC rods as heating elements. The maximum temperature inside furnace can be reached at 1200C under different flowing gas (N2, mixture Ar/H2, O2, etc...). The furnace temperature profile can use 3 distinct gradients that can be set up by 51 segments and run automatically using the 708P type advanced temperature controller. This furnace is mainly used for material research to develop various new materials.

Equipment Model : MTI Corporation, OTF-1200X-III


High Temperature Tube Furnace (HTF), MTI Corporation, OTF-1200X-III

Service fees :


Device price setting
Academic ratesIndustrial rates
$7.50/h$75.00/h
  • Add $40.00 / h to fees is manipulation are made by an operator.
  • Add 15% of administration fee if industrial user.

Booking Terms :

  • For external users, please, take contact with Gwenaël Chamoulaud or Galyna Shul.
  • For internal users, every users need to follow a formation with Gwenaël Chamoulaud or Galyna Shul before use this facility. To make online reservation, click on the link in table below, then click on the day you want to make the booking. A more detailed schedule of the day will appear. You will then be able to book the time that suits to you.
  • To book this equipment from this page, click here.